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Ultra low k dielectrics for
ULSI
interconnects
Keywords:
ULSI
, interconnect, dielectric, low-k, nanocompositeApplications: ULSI interconnects, interlayer dielectricsProblem:The modern ULSI technology requires interconnects with less and less dielectric constant. Though modern dielectrics demonstrate k = 2.5 the materials with k < 2 are required by the industryTechnology:We developed a new ultra...
Published: 10/19/2015
|
Inventor(s):
Dmitry Godovsky
,
Makhmud Keshtov
,
Sergey Kuklin
,
Vitaly Kochurov
Keywords(s):
Interconnects
,
Low-K
,
Nanocomposite
,
ULSI
Category(s):
Electronics
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