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Ultra low k dielectrics for ULSI interconnects
Keywords: ULSI, interconnect, dielectric, low-k, nanocompositeApplications: ULSI interconnects, interlayer dielectricsProblem:The modern ULSI technology requires interconnects with less and less dielectric constant. Though modern dielectrics demonstrate k = 2.5 the materials with k < 2 are required by the industryTechnology:We developed a new ul...
Published: 4/30/2015   |   Inventor(s): Dmitry Godovsky, Makhmud Keshtov, Sergey Kuklin, Vitaly Kochurov
Keywords(s): Interconnects, Low-K, Nanocomposite, ULSI
Category(s): Electronics
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